Refractive index determination of SiO2 layer in the UV/Vis/NIR range: spectrophotometric reverse engineering on single and bi-layer designs
Work
Year: 2013
Type: article
Abstract: In this paper we use spectrophotometric measurements and a Clustering Global Optimization procedure to determine the complex refractive index of SiO 2 layer from 250 nm to 1250 nm. A special commercia... more
Authors Lei Gao, F. Lemarchand, Michel Lequime
Institutions Beijing Institute of Technology, Institut Fresnel, Aix-Marseille Université, Centre National de la Recherche Scientifique, Centrale Marseille
Cites: 30
Cited by: 258
Related to: 10
FWCI: 3.853
Citation percentile (by year/subfield): 94.97
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: gold
APC paid (est): $1,962